SiO2 Nanotech, LLC was formed from SiO2 Associates, an informal partnership.
Our motto is: "From lab to fab!" We take our developed technology from the laboratory to fabrication! We insert patented technologies into specific manufacturing or fabrication lines. To accomplish this, we adapt our innovative and practical solutions such as our VitreOx� and Wet Nanobonding� technologies. Our range of patented technologies and applications range from the following applications, but not limited to: electronics, medical/surgical devices, solar cells, sport/occupational wear.
The following technologies are currently under the process of commercialization, or incorporation into a manufacturing process.
Wet Nanobonding� is a technology that bonds materials at a low temperature (below 200� Celsius), which is typically considered ineffective in conventional wafer bonding procedures. Wet NanobondingTM simplifies the bonding process by effectively bonding at a low thermal budget, as well as maintaining the structural integrity of materials that are being bonded.
VitreOx� was developed as a result of interacting with surgeons and NIH researchers. Initially, VitreOx� was proven effective in the elimination of "fogging" of intraocular lenses in secondary cataract surgery. As a matter of fact, VitreOx� has been successfully applied to at least ten patients, by Dr. Clive Sell, and his team at Associated Retina Consultants. In addition, orthopedic surgeons, brought up the need for anti-fog solutions to eliminate fogging on surgical lenses during endoscopic and laparoscopic procedures and surgeries, due to a combination of body temperature and bodily fluids.
Other interested parties include athletes that use vision protection in sports such as football, scuba diving, skiing, snowboarding; additionally occupations that require vision safety gear such as construction and laboratory work.
(Pictured below: The helmet visor to the right has been treated with VitreOx�)
We modify silicon-based surfaces such as silicon, silicon oxides, and PDMS-silicone in the nano-scale using polymer adsorption to control water condensation behavior via surface free energy and topography alterations.
We modify nano-structures of the polymer surfaces such as PC-polycarbonate, PMMA-acrylic, and PDMS-silicone via surface patterning/imprinting.
We design and synthesize below 480K (200oC) new "designer interphases" for silicon/silicate devices, which we call NanoOxides�. We design NanoOxides� with unique mechanical, electronic and/or photovoltaic properties, building on our recent success in creating commensurate and discommensurate silica interfacial phases on OH-terminated (1x1)Si(100) at RT via our patented chemical processing in ambient.
Precursor phases nucleated by chemical and thermal processing at temperature below 480 K inside our Class 10 clean-room, are used as templates for synthesizing NanoOxides.
Applications reside in four areas (1) medical implants (2) high longevity/performance photovoltaics encapsulation (3) high-k dielectrics for C-MOS gates (4) NanoBonding� where two silicon-based substrates, such as quartz, Si, or borosilicate pairs are bonded hermetically at the molecular level.
- Postal Address
1475 North Scottsdale Rd. Suite 200
Scottsdale, AZ 85257-3558
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